Lefiq-1100PRS Series (1010PRS, 1120 PRS, 1130PRS), Positive Photoresist Stripper
Description:
Lefiq-1100PRS Series are positive photoresist and is a mixture of photoresist strippers in Potassium Hydroxide. Lefiq-1100PRS Series have a pH close to 14.
Application:
These photoresist strippers are quite effective. They can be used to clean the photoresist layer as well as to remove particles which are bonded to silicon surface through an undercutting process. For more information, please contact us.
Cleaning process:
- Process temperature has to be maintained between 65 to 70 degrees C.
- Mechanically agitating the cleaning solution or performing the cleaning process within a Sonication system is highly recommended.
- It must be noted that the effective concentration of these photoresist stripper products increases from Lefiq-1100PRS to Lefiq-1130PRS.