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Lefiq thrives to serve its customer's needs and assumes highest priority to resolve its customer issues
Cost-effective Solutions for Semiconductor, Hard Disk Media and Photovoltaic Fabrication
Lefiq's advance technology is backed by the state-of-the-art analytical instruments at its R&D Lab
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Post CMP Cleaners

 

Lefiq Post CMP Series (CMP-110Si, CMP-120Al and CMP-130Ce-Zr)

Performance of Post CMP cleaners and their formulation depend on the type of slurry used in polishing process. Therefore, these cleaners may exhibit acidic or basic properties. The most common slurries are Silica, Aluminum Oxide, Cerium and Zirconium Oxides mesh based particles.

Lefiq is offering three different kinds of post CMP cleaners:

  1. Post CMP-110Si Cleaner
  2. Post CMP-120Al Cleaner
  3. Post CMP-130Ce-Zr Cleaner