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Post CMP-130Ce-Zr Cleaners

Lefiq Post CMP-130Ce-Zr Cleaners:

Description:

Lefiq Post CMP-130Ce-Zr cleaner is a strong acidic cleaning solution, capable of dissolving all Cerium and Zirconium slurry particles in form of nitrate ions.

Application:

Cleaning Cerium or Zirconium slurry particles after CMP process.  For more information, please contact us.

Cleaning process:

  • Process temperature is at room temperature
  • Process time will be 1 to 2 min depending on high concentration of acid and particle population
  • Wafers or disks must first be rinsed with Di-water to remove all loose particles, then they can be exposed to CMP-130Ce-Zr.
  • After the above post CMP cleaning process, rinse wafers or disks very well with Di-Water.
  • Dry the wafers and disks immediately to eliminate airborne contamination
  • Mechanically agitating the cleaning solution by Sonication is highly recommended.