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Cost-effective Solutions for Semiconductor, Hard Disk Media and Photovoltaic Fabrication
Lefiq's advance technology is backed by the state-of-the-art analytical instruments at its R&D Lab

Lefiq HFE50

Description:

Lefiq-HFE50 is a mixture of organic solvents capable of cleaning fine electronic devices, inside the sputtering chambers, inside the dry etch systems, etc.  This solution causes zero depletion of  Ozone layer and has a moderate water solubility.

Application: 

Lefiq-HFE50 is a cleaning solvent that can be used to remove traces of organic contamination. It is much more effective than traditional IPA cleaning. For More information Please contact us.

Process:

  • Process temperature is 20C.
  • Process time depends on surface area.